Dissolved Oxygen Monitor in Low Concentration HF HD-960L

Dissolved Oxygen Monitor in Low Concentration HF HD-960L

High stability measurement dissolved oxygen in low concentration HF. Automatically switches between three measurement ranges from μg/L to mg/L. Measurement range : 0 - 20.00 mg/L.

 

Segment: Semiconductor
Division: Wet Process Control
Base product
Manufacturing Company: HORIBA Advanced Techno Co. Ltd.

 

  • Automatic range-switching function
    Automatically switches between three measurement ranges from μg/L to mg/L, making measurement possible with the most suitable resolving power.
  • Standard installation of communication function (RS-485)
    It is possible to check measured value, change and control the settings in an instrumentation area apart from where the unit is used.
  • Easy-to-use calibration function
    The HD-960L has a function for zero electricity/zero gas calibration and span calibration.
  • Capable of measuring small samples
    Can take measurements at a minimum flow rate of 15 ml/min.

 

 

Model NameHD-960L
Measurement range RepeatabilityMeasurement rangeRepeatability
0.0 to 200.0 μg/L+/-1% FS
200 to 2000μg/L+/-1% FS
2.00 to 20.00mg/L+/-1% FS
Conditions measurement sampleSample Pressure0 to 0.1MPa
Sample flow rate15 to 200ml /min.
Sample temperature10 to 45 °C
Sample HF concentration0 to 5000ppm
Transmission output4-20mA, 4points
Contact output4 points
Power supplyDC24V +/- 10% 15W
Combined Sensor unitDO-100
Combined Sensor#5600
Sample inlet/outlet1/4 inch tube

Schematics

Chemical Concentration Monitoring in Wet Process in Semiconductor Manufacturing Process
Chemical Concentration Monitoring in Wet Process in Semiconductor Manufacturing Process
Readout47-Dissolved Oxygen Monitor for Semiconductor Wet process Performance of the Dissolved Oxygen Monitor Used in the Semiconductor Wet_Process
CategoryDocuments
Size 1.94 MB
FiletypePDF

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