Gas Monitor for Chamber Cleaning End Point Monitoring IR-200

Gas Monitor for Chamber Cleaning End Point Monitoring IR-200

The IR-200 monitors SiF4  gas concentration in real time and identifies the cleaning end-point based on SiF4 gas concentrations.

Segment: Semiconductor
Division: Dry Process Control
Base product
Manufacturing Company: HORIBA Ltd.
  • Monitor SiF4 concentration up to 5000 ppm
  • Compact design
  • Can be instralled into exhaust lines
  • In addition to SiF4, this gas monitor can be used to measure CIF3 and other gases.

 

Model nameIR-200
Measurement GasSiF4 gas
Measurement Range0 to 5000ppm(0 to 500Pa)
Repeatability

±1%F.S.

Cell length30mm, 1.2 in
Response Time30 seconds or less (T90)
Pressure Resistance0.3MPa(A)
Gas Cell Heating Temperature150 ℃ (Max)
Contact MaterialSUS-316L、BaF2、FKM
Leak Rate1×10-10Pa・m3/s
FittingNW25 Flange
Analog Output4 to 20 mA DC
Contact Output3 channels (ERR、High、Low)
Contact Input1 channel for zero calibration
Power24 V DC, 30 W (Max)
Dimension (W x H X D)

Sensor: 150×268×90mm / 3.5x5.9x10.6 in

Controller: 48×96×130mm / 1.9x3.8x5.1 in

Mass

Sensor:4.5kg / 9.9 lb

Controller:0.5kg / 1.1 lb

Gas Concentration Monitoring for Chamber Cleaning End Point Monitoring in Semiconductor Manufacturing Process
Gas Concentration Monitoring for Chamber Cleaning End Point Monitoring in Semiconductor Manufacturing Process

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