Gratings for Synchrotron, FEL and EUV light sources

Holographic Lamellar Gratings

HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.

Holographic recording and ion-etching allows us to tailor the groove shape and distribution to have:

  • Either constant or Variable Line Spacing (VLS)
  • Either constant or Variable Groove Depth (VGD).
     

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Segment: Scientific
Manufacturing Company: HORIBA France SAS
 
  • Groove density : up to 4000gr/mm
  • Dimensions : up to 500mm
  • Substrate material : silicon, fused silica
  • Substrate shape : plane, spherical, cylindrical, toroidal
  • VLS or constant groove density
  • Efficiency tunability with Variable Groove Depth (VGD)
  • High quality substrate with slope error ~0.1µrad RMS
  • Ultra-low grooves roughness :  ~0.2nm RMS
  • Coating : Au, Ni, Pt (other coating on request)

 

 

To help us to check the feasibility of your grating, please share the grating specifications :

  • Substrate material
  • Substrate size
  • Useful area
  • Substrate shape (plane, spherical, …)
  • Substrate RMS microroughness (nm)
  • Substrate RMS slope error (µrad or arcsec)
  • Groove density : constant or VLS
  • If VLS, N(x) =N0*(1+2*b2x+3*b3x2+4*b4x3+…)

Where :

N0 (mm-1) =

b2 (mm-1) = 

b3 (mm-2) =

  • Groove shape
  • Energy range
  • Cff coefficient or angle of incidence
  • Coating

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