Gratings for Synchrotron, FEL and EUV light sources
Holographic Lamellar Gratings
HORIBA Scientific holographic lamellar gratings exhibit ultra-low grooves roughness and unique efficiency uniformity making them ideal for Synchrotron, Free Electron Laser (FEL), EUV or Soft X-ray light sources.
Holographic recording and ion-etching allows us to tailor the groove shape and distribution to have:
- Either constant or Variable Line Spacing (VLS)
- Either constant or Variable Groove Depth (VGD).
Segment: Scientific
Division: OEM
Manufacturing Company: HORIBA France SAS
- Groove density : up to 4000gr/mm
- Dimensions : up to 500mm
- Substrate material : silicon, fused silica
- Substrate shape : plane, spherical, cylindrical, toroidal
- VLS or constant groove density
- Efficiency tunability with Variable Groove Depth (VGD)
- High quality substrate with slope error ~0.1µrad RMS
- Ultra-low grooves roughness : ~0.2nm RMS
- Coating : Au, Ni, Pt (other coating on request)
To help us to check the feasibility of your grating, please share the grating specifications :
- Substrate material
- Substrate size
- Useful area
- Substrate shape (plane, spherical, …)
- Substrate RMS microroughness (nm)
- Substrate RMS slope error (µrad or arcsec)
- Groove density : constant or VLS
- If VLS, N(x) =N0*(1+2*b2x+3*b3x2+4*b4x3+…)
Where :
N0 (mm-1) =
b2 (mm-1) =
b3 (mm-2) =
- Groove shape
- Energy range
- Cff coefficient or angle of incidence
- Coating
