Large Flow Liquid Source Vaporization Control System LE Series

Large Flow Liquid Source Vaporization Control System LE Series Image

A high-flow, high-efficiency, liquid vaporizer with flow channels and heater elements embedded in a cast aluminium block which ensures maximum heat transfer, and the elimination of both cold spots and the risk of condensation. This Liquid Source Vaporization Control System can operate at up to 300 °C and can vaporize up to 30g/min of IPA (or equivalent).

 

Segment: Semiconductor
Division: Fluid Control
Base product
Manufacturing Company: HORIBA STEC Co. Ltd.
  • Innovative design maximizes vaporization rate
  • New injector nozzle ensures consistent liquid injection which contributes to stable vapor output concentration
  • All stainless steel, fully swept flow path for maximum corrosion resistance and minimum particulate generation
  • Compatible with many types of precursors materials.

 

 

Application liquidH2O/IPA/TEOS/SiCl4

Please contact HORIBA if you require vaporizing any liquid materials that are not listed here.
Maximum vaporization volume (gas flow rate)H2O : 10g/min (12.4 SLM)
IPA : 30g/min (11.1 SLM)
TEOS : 50g/min(5.3 SLM)
SiCl4 : 130g/min(17.1 SLM)
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