Real Time Interferometric Process Monitor [CCD] Laser Interference Camera
Our Real Time Interferometric Process Monitor provides high precision detection of film thickness and trench depth during the etching/coating process.
Interference occurs when monochromatic light hits the sample surface, resulting in different optical path lengths due to film thickness and height variations in the film.
This system calculates the etching and coating speed of the monitored area by monitoring the interference intensity based on the cycle, leading to detection of the end-point from the prescribed film thickness and trench depth.
Based on this theory, this system is extremely stable and can be used with complex multi-layer films.
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