Multi-point Chemical Solution Monitor CS-100F4

Multi-point Chemical Solution Monitor CS-100F4

The CS-100F4 is a new system concept that enables multipoint chemical measurement in a single unit. The CS-100F4 further expands HORIBA’s CS series lineup, which is known for its high-precision concentration monitoring of the various chemicals used in the etching and cleaning processes for semiconductor manufacturing. Sampling cells (up to four points) are connected directly to the internal piping of the cleaning unit by fiber optic cable and the transmission of optical signals allows inline real-time measurement. As well as improving cost savings and space utilization, this multipoint inline measurement delivers optimal control of the many chemicals used in semiconductor etching and cleaning processes.


Segment: Semiconductor
Division: Wet Process Control
Base product

Example of installation:



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