PR-PD2BLI

Blanks Mask Particle Detection System PR-PD2BLI

Blanks Mask Particle Detection System

The PR-PD2BLI enables fine particle detection down to 0.1 μm and also boasts a multi-stage sorter plus a full range of communication functions. The Blanks Mask is capable of performing high-throughput measurement on even the finest of particles.

 

Segment: Semiconductor
Division: Metrology
Base product
Manufacturing Company: HORIBA Ltd.
  • High sensivity and high throughput
    0.1μm/5.5 min (142mm)
    0.15μm/2.75 min (142mm)
    0.2μm/33 sec (142mm)
  • Multi-loader/unloader correspondence.

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Reticle/Mask Particle Detection Lithography Process in Semiconductor Manufacturing Process
Reticle/Mask Particle Detection Lithography Process in Semiconductor Manufacturing Process

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