HORIBA plasma emission controllers provide excellent plasma control of reactive sputtering processes (PVD).
The fast feedback control of the reactive gas flow in a reactive sputtering process helps enhance product quality and achieve greater productivity. This is achieved by monitoring the plasma generated and the voltage of the power supply in the sputtering process.
HORIBA Plasma Emission Controllers can speed up the deposition process by controlling the transition region and optimize distribution.
Plasma Emission Controller
Do you have any questions or requests? Use this form to contact our specialists.
