HORIBA - Semiconductor

Plasma Emission Control

HORIBA plasma emission controllers provide excellent plasma control of reactive sputtering processes (PVD).

The fast feedback control of the reactive gas flow in a reactive sputtering process helps enhance product quality and achieve greater productivity. This is achieved by monitoring the plasma generated and the voltage of the power supply in the sputtering process.

HORIBA Plasma Emission Controllers can speed up the deposition process by controlling the transition region and optimize distribution.

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