HORIBA - Semiconductor

Pressure Control

HORIBA offer a choice of products within pressure control to monitor, regulate or control the pressure in a gas supply line.

HORIBA pressure control products include digital high performance pressure sensors and piezo valves. They can help eliminate the effects of cross talk caused by switching high flow lines.

HORIBA wafer cooling system uses helium gas to reduce heat damage and our exhaust pressure controller maintains a consistent level of pressure in a chamber.

Related Products

DZ-100
more DZ-100

Ultra-thin Mass Flow Controller

CRITERION D500
more CRITERION D500

Pressure Insensitive Mass Flow Module

XF-100 Series
more XF-100 Series

Digital Liquid Mass Flow Meters

PTFM-ONE-DT
more PTFM-ONE-DT

Dual Pitot Tube Flow Meter

Vapor Concentration Control
Semiconductor Manufacturing Process
Vapor concentration control of precursors provide substantial improvement in stabilizing MOCVD processes. By measuring a precursor partial pressure in a downstream line with a Non Dispersive Infrared (NDIR) technology and controlling its total pressure, a precursor concentration can be kept constant. This precursor concentration control is validated as a practical method against a temperature fluctuation of a cylinder bath and a failure of reaching a saturation pressure in a cylinder.
Gas Mass Flow Control and Measurement in Research and Testing Laboratories
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Liquid Source Vaporization and Supply in Research and Testing Laboratories
Testing and Laboratories
Gas Mass Flow Control and Measurement for Reference Value of PM2.5 Measurement
Environmental
Process Control and In-situ Measurement for Photovoltaic Manufacturing Process
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Test Gas Generation in Research and Testing Laboratories
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Gas and Water Monitoring in Containers and Packaging
Optical Fiber Manufacturing Process in Electrical Equipment
Optical Fiber Manufacturing Process

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