HORIBA - Semiconductor

Thin Film Analysis

Production processes are evolving rapidly which is reflected in a growing need for high-grade evaluation and analysis of a wide range of thin films and complex multilayer structures. HORIBA systems are capable of measuring film properties including stress, thickness and optical constants of complex and multilayer films and ultra-thin SiO2 films.

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PR-PD2
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Reticle/Mask Particle Detection System

PR-PD2BLI
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Blanks Mask Particle Detection System

PR-PD2HR
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Reticle / Mask Particle Detection System

PR-PD3
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Compact Reticle/Mask Particle Detection System

PR-PD5
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Low-cost Reticle/Mask Particle Detection System

RP-1
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Reticle/Mask Particle Remover

Gas and Water Monitoring in Containers and Packaging

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