Feature Article: Measuring Technology and Applications for Demands from Wet Process

Auteur : Kentaro INOUE*, Riichiro SUZUKI

1 février 2019

Author(*) Information: HORIBA Advanced Techno, Co., Ltd.

Various kinds of chemicals and large amounts of ultra-pure water are used insemiconductor wet process. Management of those chemicals and ultra-purewater is important for improvement of process yields. Due to increasingcomplexity and miniaturization of semiconductor devices, new processes andchemicals are appearing, which can often require changes required processcontrol levels. HORIBA has been providing various process monitors based onelectrochemical or spectroscopic technologies for wet process since the late1980s. This paper describes some of those techniques briefly and introducesseveral products for wet process and applications.

Note: Full paper of the same content in Japanese is in Readout No.48-Japanese edition.

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