Absorption spectroscopic method
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
TMAH/H2O2 Monitor, CS-139E - High-speed response and compact chemical solution concentration monitor
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices