Chemical Solution Concentration Monitor
Enables highly stable, precise measurement of multi components chemical solution utilizing HORIBA's spectroscopic measurement technology
Enables improved cleaning process efficiency with "high temperature chemical measurement", "stable operation" and "compact body size" to meet leading-edge process requirements.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
High stability measurement dissolved oxygen concentration in low concentration HF. Automatically switches between three measurement ranges from μg/L to mg/L. Measurement range : 0 - 20.00 mg/L.
High precision, wide-range dissolved ozone monitor. In-line type sensor.
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
Wide range HF concentration monitor from low to undiluted liquid. High precision measurement with auto range switching function. All PFA sensors.
TMAH/H2O2 Monitor, CS-139E - High-speed response and compact chemical solution concentration monitor
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
24-hour real-time monitoring of FPM solution concentrations in semiconductor wet-etching processes
24-hour real-time monitoring of HF/HNO3 solution concentrations in semiconductor wet-etching processes
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices
Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.
Measurement range: 0 -10%
TMAH monitor can measure the wide range from 0 - 10 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
High precision TMAH monitor can measure the range from 0 - 3 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm
Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm
Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm
Suitable pH meter for monitoring processes and quality inspections in various industries.