Gas Concentration Monitor
In-line compact vapor concentration monitor, enables MOCVD precursor delivery to be stable.
Monitors SiF4 gas concentration in real time, and identifies the cleaning end-point based on SiF4 gas concentrations.
In-line compact vapor concentration monitor, enables MOCVD precursor delivery to be stable.
Monitors SiF4 gas concentration in real time, and identifies the cleaning end-point based on SiF4 gas concentrations.