In-line Process

Chemical Concentration Monitoring

HORIBA provide a wide range of inline and offline concentration monitors for the different high and low concentration wet etching processes for Low-k, Al, Oxide/Nitride, Poly Silicon etc. In addition to monitors for wet etching a wide range of monitors for the different cleaning steps, for example removal of particles, resist, metallic layer, organic layers, oxides, polymers etc are also available.
To assist selection of the correct monitor for you chemistry please view our Chemical Solution Monitor ^*1brochure.
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Low Concentration Type HF/HCl/NH3 Concentration Monitor HF-960M

High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.

Dissolved Ozone Monitor OZ-96 - This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

In-line type Dissolved Ozone Monitor OZ-96i - Ideal for ozone fluid density control in semiconductor production processes

Ideal for ozone fluid density control in semiconductor production processes

Chemical Concentration Monitoring

Low Concentration Type HF/HCl/NH3 Concentration Monitor HF-960M

Dissolved Ozone Monitor OZ-96 - This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

In-line type Dissolved Ozone Monitor OZ-96i - Ideal for ozone fluid density control in semiconductor production processes

Carbon Sensor Conductivity Meter (High concentration type) HE-960HC

Wide range TMAH Concentration Monitor HE-960H-TM

Carbon Sensor Resistivity Meter HE-960R-GC(W)

2-Channel Resistivity Meter HE-960RW-GC(W)