
Chemical Concentration Monitoring
HORIBA provide a wide range of inline and offline concentration monitors for the different high and low concentration wet etching processes for Low-k, Al, Oxide/Nitride, Poly Silicon etc. In addition to monitors for wet etching a wide range of monitors for the different cleaning steps, for example removal of particles, resist, metallic layer, organic layers, oxides, polymers etc are also available.
To assist selection of the correct monitor for you chemistry please view our Chemical Solution Monitor *1 brochure.
*1 This will open in a new window
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
Ideal for ozone fluid density control in semiconductor production processes
Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm
TMAH monitor can measure the wide range from 0 - 10 %. Chemical resistance carbon sensor. Suitable for management of TMAH concentration in developer solution.
Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm
Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm
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