Semiconductor Page Heading


HORIBA’s Particle Detection and Removal systems are essential to improve yield in the semiconductor lithography process.

Particle Detection System


Related Products

En savoir plus LEM Series

Camera Endpoint Monitor based on Real Time Laser Interferometry

En savoir plus GD-Profiler 2™

Discover a Whole New World of Information with Glow Discharge Optical Emission Spectrometer

En savoir plus Plasma Profiling TOFMS

Ultra-Fast, Sensitive and High Resolution Depth Profiling technique

En savoir plus PD Xpadion

Reticle / Mask Particle Detection System

En savoir plus RP-1

Reticle/Mask Particle Remover

En savoir plus PR-PD3 Pro

Reticle / Mask Inspection System

Request for Information

Do you have any questions or requests? Use this form to contact our specialists.