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Particle Characterization Webinars

Spanning topics from introductory discussions to advanced applications and industry groups, the HORIBA particles webinar series is a great source of information on the world of particles. To learn about upcoming webinars and more, sign-up for our Particle Characterization Newsletter.

Next Webinar:

May 19th at 10:30 AM PDT, 1:30 PM EDT
Integrated Characterization of Organic Matter for Water Treatment Optimization
Dr. Kati Bell | Director of Water Strategy of Brown & Caldwell
Dr. Martha Wells | Chemical Consultant to Brown and Caldwell
| Register Here |

Drs. Katherine Y. Bell, (Director of Water Strategy), and Martha J.M. Wells (Chemical Consultant to Brown and Caldwell) will co-present this webinar. Kati will provide an overview of water treatment at Brown and Caldwell and what services are offered. Martha will provide the fundamentals of the technologies applied and a discussion of our current understanding of organic matter aggregation in water. 

What you will learn:  

  • Application of EEM-PARAFAC, zeta-potential, DLS, and LD to water treatability studies     
  • Fundamentals of using these modes of advanced instrumentation 
  • Conceptual understanding of environmentally relevant aggregates of aqueous organic matter 

    
Who would benefit from attending: 

  • Water quality lab managers, engineers, chemists, water treatment plant operators, academic researchers, and graduate students who are interested in water quality topics. 

Future Webinars (subject to change)

June 8th at 10:30 AM PDT, 1:30 PM EDT
Fine Particle Characterization in Chemical Mechanical Planarization (CMP) Slurries with Fluorescence Correlation Spectroscopy
Prof. Edward E. Remsen | Bradley University, Mund-Lagowski Department of Chemistry & Biochemistry
| Register Here |

Fabrication of commercial integrated circuits depends critically on the physical and chemical properties of the abrasive slurry particles used to polish silicon wafer surfaces via chemical-mechanical planarization (CMP) to near-atomic flatness. The particle size distribution (PSD) of the abrasive particles is a key factor in the CMP process due to its connection with polishing efficiency and defect creation on wafers during polishing. In this presentation the utility of a single-molecule spectroscopic technique, fluorescence correlation spectroscopy (FCS), in this application is described. The use of FCS in conjunction with a complementary technique, particle tracking using the ViewSizer 3000 multi-laser Nanoparticle Tracking Analysis (m NTA), is described as an approach to meet this challenge.

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Synergy Series

On-Demand Webinars

Browse Products

Partica LA-960V2
more Partica LA-960V2

Laser Scattering Particle Size Distribution Analyzer

Partica mini LA-350
more Partica mini LA-350

Laser Scattering Particle Size Distribution Analyzer

ViewSizer 3000
more ViewSizer 3000

Multi-Laser Nanoparticle Tracking Analysis (NTA)

Eyecon2™*
more Eyecon2™*

Direct Imaging Particle Analyzer

PSA300*
more PSA300*

Static Image Analysis System Particle Size

SA-9600 Series
more SA-9600 Series

BET Flowing Gas Surface Area Analyzers

SZ-100
more SZ-100

Nanopartica Series Instruments

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