Measuring techniques are necessary for the analysis and development of next-generation materials. HORIBA supports your new material development and quality control with specialized measuring techniques.
Overview of All Material Interests:
Film thickness- Spectroscopic Ellipsometry
- Reflectometry
- X-Ray Fluorescence
- GD-OES/
| | | | Optical Constants- Spectroscopic Ellipsometry
- Reflectometry
| | | | Band gap- Spectroscopic Ellipsometry
- Photoluminescence
- Fluorescence
|
Roughness- Spectroscopic Ellipsometry
- AFM
- Raman-AFM
| | | | Crystallinity- Spectroscopic Ellipsometry
- Raman Spectroscopy
- Raman-AFM
| | | | Stoichiometry- Spectroscopic Ellipsometry
- Raman Spectroscopy
- Raman-AFM
- AFM
|
Stress/Strain- Raman Spectroscopy
- Cathodoluminescence
| | | | Defect Analysis- Raman Spectroscopy
- Photoluminescence
- Cathodoluminescence
- X-Ray Fluorescence
- AFM
- Raman-AFM
| | | | Impurity Analysis- Raman Spectroscopy
- Raman-AFM
- Photoluminescence
- Cathodoluminescence
- X-Ray Fluorescence
- GD-OES
- PP-TOFMS
- Instrumental Gas Analyzers
|
Doping Concentration- Photoluminescence
- PP-TOFMS
| | | | Carrier Concentration- Photoluminescence
- Instrumental Gas Analyzers
- GD-OES
- AFM
- Raman-AFM
| | | | Elemental Composition- X-Ray Fluorescence GD-OES
- PP-TOFMS
- Instrumental Gas Analyzers
|
Chemical Identification- Raman Spectroscopy
- Raman-AFM
| | | | Chemical Concentration- Raman Spectroscopy
- Chemical Concentration Monitors
| | | | Carrier Lifetime |
| Surface Potential | | | | Layers of 2D Materials- Spectroscopic Ellipsometry
- Raman Spectroscopy
- Photoluminescence
- AFM
- Raman-AFM
| | | | Electrical Properties |
| Particle Analysis | | | | | | | | |
