HORIBA's expertise in analytical instrumentation has provided the foundations for a range of successful industrial monitoring tools for the semiconductor, pharmaceutical and chemical industries.
With its new compact design and enhanced image quality, the LEM interferometer for in-situ etch rate monitoring and end-point detection can be mounted on any process chamber with a direct top view of the wafer. It provides a real-time digital CCD image of the sample surface, making its 30-m laser beam positioning simple and accurate. Based on interferometry technique, the LEM provide in-situ etch/growth rate monitoring for endpoint detection of a wide range of dry etch applications.
Endpoint / Chamber Health Monitor based on Optical Emission Spectroscopy and MWL Interferometry
Vapor Concentration Monitor
High-grade type Gas Monitor for Chamber Cleaning End Point Monitoring
Camera Endpoint Monitor based on Real Time Laser Interferometry
Residual Gas Analyzer
Plasma Emission Controller
Vapor Concentration Controller
Capacitance Manometer
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