HORIBA's expertise in analytical instrumentation has provided the foundations for a range of successful industrial monitoring tools for the semiconductor, pharmaceutical and chemical industries.
With its new compact design and enhanced image quality, the LEM interferometer for in-situ etch rate monitoring and end-point detection can be mounted on any process chamber with a direct top view of the wafer. It provides a real-time digital CCD image of the sample surface, making its 30-m laser beam positioning simple and accurate. Based on interferometry technique, the LEM provide in-situ etch/growth rate monitoring for endpoint detection of a wide range of dry etch applications.
Endpoint / Chamber Health Monitor based on Optical Emission Spectroscopy and MWL Interferometry
Optical Emission Spectroscopy Etching End-point Monitor
Gas Monitor for Chamber Cleaning End Point Monitoring
Vapor Concentration Monitor
High-grade type Gas Monitor for Chamber Cleaning End Point Monitoring
Camera Endpoint Monitor based on Real Time Laser Interferometry
Compact Process Gas Monitor
Plasma Emission Controller
Vapor Concentration Controller
Capacitance Manometer
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