Plasma Emission Controller RU-1000

Excellent Plasma Control over Reactive Sputtering.

The superb feedback control of the reactive gas flow in a reactive sputtering process helps you enhance product quality and achieve greater productivity by monitoring the plasma generated by sputtering or the voltage of the power supply for the sputtering process.

Optical Emission Spectroscopy Etching End-point Monitor EV-140C

Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.

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