Analysis based on
Absorption Spectrophotometry
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).
Ideal for ozone fluid density control in semiconductor production processes
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
TAPPS is a complete pump/probe transient absorption system designed to assist scientists in understanding the deactivation dynamics of excited states.
The investigation of ultrafast dynamics in chemistry and biology demands information over a wide spectral range to identify the changing concentration of species and molecular exci-tation.