Manufacturing Process Control
& Management

High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Ideal for ozone fluid density control in semiconductor production processes

The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.

The LB-550, using a dynamic light scattering technique, is able to measure very concentrated suspensions, up to 40% solids in many cases, over a size range of 1nm-6µm.

High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.

For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.

MP-32S/M requires SEM as excitation source and it can evaluate defects, impurities and crystalline construction in micro region.

MR-VS series are new special instruments for spectrum measurement which employ compact spectrograph and optical fiber.

Easy measurement of cathodoluminescence spectrograph by mounting to SEM.

This field-type dissolved oxygen meter measures dissolved oxygen concentration (DO), oxygen concentration (O2), saturation (SAT.RATIO) and temperature of water solutions. It uses a laboratory sensor to enable BOD measurement....