Semiconductor & FPD
Manufacturing Process Control

This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.

The HORIBA Scientific GD-Profiler HR™ gives the optimum in terms of resolution and number of elements to solve analytical problems even in the most complex matrices.

High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.

High precision flow rate measurement with one-touch operation.

High precision flow rate measurement with one-touch operation.

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Ideal for ozone fluid density control in semiconductor production processes

Real time interferometric endpoint for depth targeting.