Semiconductor & FPD
Manufacturing Process Control

High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.

For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.

The reliable thermal sensor mass flow controller installed solenoid valve for a wide variety of industry. Wide control range from 10 SCCM to 200 SLM.

High stability, compact mixed injection vaporizer system using the new vaporization method, "tornado flow". Suitable for vaporizing liquid sources pyrolyzed easily.

Vaporize liquid source stably by the gas-liquid mixture vaporization method. Can be used for low temperature and large flow production.

The best-selling digital mass flow controller offering multi range/multi gas solutions. High accuracy, fast response, and compact size. All metal.

Endpoint controller for plasma etch cluster tools: Simultaneous Real Time Multi-Chamber - Multi diagnosis monitor

Achieves dramatic cost reductions in advanced mask inspections

High sensitive particle detection down to 0.35µm.

High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.