Application
Chemical Solutions Analysis
Resistivity meter having the 2-channel carbon sensor. Measurement range: 0 - 100.0 MΩ・cm
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
Carbon sensor resistivity meter. Measurement range: 0 - 100.0 MΩ・cm
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.
Ideal for ozone fluid density control in semiconductor production processes
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices