Industry
Printing
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
High throughput compact rugged spectrograph, suitable for dedicated Raman analysis and portable applications. Available rack mounted for industrial settings.
The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.
The LB-550, using a dynamic light scattering technique, is able to measure very concentrated suspensions, up to 40% solids in many cases, over a size range of 1nm-6µm.
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
In-Line Spectroscopic Ellipsometer for Web Coater and Roll to Roll Systems
Single point analysis and automated hyperspectral imaging.
Dual vacuum modes.
Spot sizes from 1.2 mm to 10 µm.