Semiconductor

Achieves dramatic cost reductions in advanced mask inspections

For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.

Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).

Low running costs thanks to a compact design, plus remarkable versatility

High sensitive particle detection down to 0.35µm.

Vaporize liquid source stably by the gas-liquid mixture vaporization method. Can be used for low temperature and large flow production.

High stability, compact mixed injection vaporizer system using the new vaporization method, "tornado flow". Suitable for vaporizing liquid sources pyrolyzed easily.

Support for multi-batu, single-bath, and dingle-wafer cleaning systems

High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.

High precision liquid mass flow controller using the sensor with a unique cooling method. Can control from micro-liter to ultra low flow rate.