Industry
Lithography
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
Low running costs thanks to a compact design, plus remarkable versatility
For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.
Achieves dramatic cost reductions in advanced mask inspections
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices
High-speed response and compact profile of the CS-131, SC-1 (standard clean) Solution Concentration Monitor makes it the ideal choice for single wafer and batch type cleaning devices.
The LA-930 uses Mie Scattering (laser diffraction) to measure particle size of suspensions or dry powders. The speed and ease-of-use of this technique makes it the most popular for many applications.