It uses a very high spectral resolution monochromator automatically controlled (choice of gratings, slits and detectors) for continuous measurements over the whole range. The VIS range is covered by a photomultiplier detector while the NIR range uses an InGaAs photodiode.

The spectral range of a spectroscopic ellipsometer is very important as it determines the possible applications. The NIR range provides two main advantages:

  • Longer wavelengths ensure a transparent region for thickness measurements of all the materials absorbing in the visible range.
  • The accuracy for the characterization of thick films is enhanced.

The UVISEL NIR is mainly dedicated to semiconductor, optical coatings, optoelectronic and telecommunication applications.

Manufactured by HORIBA Scientific


Characterization of thickness and optical constants in the NIR-VIS spectral range of thin films and multilayer stacks for:

  • Dielectrics

  • Semiconductors

  • Conductive oxides

  • Compound alloys

  • Thin metal films

  • Glass

Determination of compound alloy composition

Characterization of silicon crystallinity

NIR applications at special common wavelengths (1550, 1300,. nm)

Measurement of thick films up to 40 ┬Ám

Material properties: graded, anisotropic,