Industry
Lithography
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
Low running costs thanks to a compact design, plus remarkable versatility
For use in combination with Manufacturing Devices. Low-cost reticle/mask particle inspection with enhanced versatility and compactness.
Achieves dramatic cost reductions in advanced mask inspections
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
Products: UVISEL Plus: 190-920 nm | NIR Option: 2100 nm
Measure thin film thickness and optical constants. The reference ellipsometer for research and process development.
TMAH/H2O2 Monitor, CS-139E - High-speed response and compact chemical solution concentration monitor
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices