Industry
Wet
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
Measure the ultra-low density of silica at the finest sensitivity of 0.01 µg/L (0.01 ppb).
The HP-480 industrial pH meter is a standard type pH meter that mainly includes frequently used functions.
The CS-137 offers reliable, unobtrusive round the clock, real-time monitoring of BHF solution concentrations primarily used for wet etching in semiconductor processes.
Ideal for ozone fluid density control in semiconductor production processes
This dissolved ozone concentration monitor is able to cover a broad measuring range from low concentrations to high concentrations.
TMAH/H2O2 Monitor, CS-139E - High-speed response and compact chemical solution concentration monitor
High-speed response and compact profile make the TMAH/H2O2 Solution Concentration Monitor the ideal choice for wafer and batch type cleaning devices
High-speed response and compact profile make the SPM Solution Concentration Monitor the ideal choice for water and batch type cleaning devices
High-speed response and compact profile make the SC-2 Solution Concentration Monitor the ideal choice for wafer and batch-type cleaning devices