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Surface analysis and thin film characterization allow the study of a material’s outermost layers, from the nanometer to micrometer scale, to assess composition, thickness, uniformity, and structural integrity. This type of analysis provides critical insights into a material’s surface chemistry, coatings, and layered structures, which influence performance, durability, and functionality.
Different techniques, such as Ellipsometry or Raman and Photoluminescence (PL) Spectroscopy, can provide non-destructive measurement of film thickness and optical properties, and elemental analysis for quality control and regulatory compliance. This analysis is indispensable in fields such as semiconductors, photovoltaics, coatings, metallurgy, and advanced manufacturing, where surface and thin film properties define material behavior, efficiency, and longevity.
Focuses on the physical shape, geometry, and internal structure of the thin film.
Covers how the material interacts with light and electricity, critical for functional and optoelectronic materials.
Describe the elemental and molecular makeup which governs stability, performance, and compatibility.
Raman Spectroscopy is a powerful tool for surface and thin film analysis, offering non-destructive characterization of molecular composition, crystallinity, and strain effects. By detecting vibrational modes of molecules and lattice structures, Raman provides insights into thin film uniformity, phase purity, and stress distribution, which are crucial for optimizing material performance.
Photoluminescence (PL) spectroscopy, both steady-state and time-resolved, is a key method for investigating optical and electronic properties of thin films. It measures carrier lifetimes, defect states, and energy band structures, helping to assess material quality and efficiency. This technique is extensively used in optoelectronics, LED development, and perovskite solar cells, where optimizing light-emitting and energy conversion properties is fundamental to improving performance and reliability.
Spectroscopic ellipsometry is a highly sensitive technique for measuring the thickness, refractive index, and optical constants of thin films with nanometer precision. Because it is non-contact and non-destructive, it is widely used for monitoring deposition processes, analyzing multi-layered coatings, and assessing the optical behavior of materials. This technique plays a key role in semiconductor manufacturing, display technology, and coatings for optics, ensuring precise control over film properties to enhance product performance and efficiency.
AFM-Raman spectroscopy combines Atomic Force Microscopy (AFM) with Raman Spectroscopy to enable simultaneous nanoscale surface imaging and chemical characterization. AFM measures surface topography, roughness, and mechanical properties such as adhesion, elasticity, and hardness, while Raman spectroscopy provides complementary molecular and structural data. This dual capability is especially useful in thin film coatings, semiconductor processing, and biomaterials, where understanding both the physical and chemical properties at the nanoscale is critical for quality control and research in functional materials.
Unlike surface-only techniques, Glow Discharge Optical Emission Spectroscopy (GDOES) allows researchers to analyze buried interfaces, diffusion profiles, and multi-layer coatings, making it essential for understanding material composition beyond the surface. This technique is widely used in semiconductors, metallurgy, corrosion studies, and advanced coatings, where controlling layer thickness, composition, and contamination is critical for performance and durability.
Photoluminescence and Raman Wafer Imaging
Spectroscopic Ellipsometer from FUV to NIR: 190 to 2100 nm
Scanning Probe Microscope with Chemical Signature
Pulsed-RF Glow Discharge Optical Emission Spectrometer
X-ray Analytical Microscope (Micro-XRF)
Cathodoluminescence Solutions for Electron Microscopy
Modular Research Fluorometer for Lifetime and Steady State Measurements
Laser Scattering Particle Size Distribution Analyzer
Carbon/Sulfur Analyzer
(Flagship High-Accuracy Model)
Oxygen/Nitrogen/Hydrogen Analyzer
(Flagship High-Accuracy Model)
Webinars
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