HORIBA Advanced Techno Co., Ltd. today announced the launch of the CS-900F, a chemical concentration monitor designed for wet process chemicals used in semiconductor manufacturing, including cleaning and etching applications.
Wet chemical processes are critical to semiconductor yield, because variations in chemical concentration can affect the uniformity of surface treatment. Accordingly, precise control of chemical concentration is essential.
The CS-900F adopts a non-contact measurement method that can be implemented simply by mounting the cell unit onto piping. -This approach helps reduce the risk of chemical leakage and contamination*1.
To meet the industry’s demand for smaller in-tool components, the CS-900F introduces a fiber-optic cable and relocates the spectrometer to the main unit. This reduces the volume of the cell unit installed inside customers’ equipment by approximately 60%*2 compared with HORIBA’s previous models. Despite the significant size reduction, the CS-900F incorporates an internal reference*3 mechanism that enhances stability and helps maintain high measurement accuracy by minimizing the impact of external disturbances—thereby supporting a smaller equipment footprint*4.
In addition, the CS-900F expands the measurable wavelength range to approximately three times that of previous models*2, enabling support for a wider variety of wet process chemicals.
In addition to standard SC-1 (ammonium hydroxide–hydrogen peroxide aqueous solution), the CS-900F supports processes using complex and hazardous chemistries, including mixed solutions of nitric, phosphoric, and acetic acids. It can directly measure high-temperature process liquids at up to 80°C without sample pretreatment, helping improve operational safety and ease of handling.
Takuya Onoda, Product Line Manager at HORIBA Advanced Techno Co., Ltd., explains:
“Since its launch in 1995, the CS Series has continued to evolve in response to customer needs. With the CS-900F, we adopted a fiber-optic approach to help reduce footprint—an industry-wide priority in semiconductor manufacturing. We also expanded the range of supported wet process chemicals, further enhancing stability and versatility as the flagship model in the CS Series.”
*1 Contamination: the introduction of foreign substances that can compromise the original purity or quality.
*2 Comparison with HORIBA’s previous models. Actual results may vary depending on usage and conditions.
*3 Reference light: a comparison standard used in absorbance measurements to compensate for fluctuations in the light source and changes in optical components over time. Using reference light improves measurement accuracy and helps reduce the impact of external disturbances.
*4 Footprint: the floor space occupied by the equipment or instrument.
Related Links
https://www.horiba.com/int/water-liquid/products/detail/action/show/Product/cs-900f-6984/
