Semiconductor Page Heading

Particle Detection System

HORIBA offer systems which are widely used in the semiconductor lithography process. These systems detect particles on a reticle/mask with high reliability and long-term stability. The systems can measure particles on each glass/pellicle surface with precision and high throughput contributing to yield improvements for any semiconductor manufacturing facility. HORIBA also provide a Particle Remover that is designed to be used in conjunction with the detection system to automatically remove any particles detected.

Related Products

more PD Xpadion

Reticle / Mask Particle Detection System

more PR-PD3 Pro

Reticle / Mask Inspection System

more RP-1

Reticle/Mask Particle Remover

Request for Information

Do you have any questions or requests? Use this form to contact our specialists.