13 April 2016 - A HORIBA information event offers participants detailed insights into the emission measurement technology and the legal challenges of tomorrow.

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Combining plasma profiling TOFMS with TOF-SIMS depth profiling for microelectronic applications

24 March 2016 - Read our recent article showing the comparison of TOF-SIMS and Plasma Profiling TOFMS (PP-TOFMS) depth profiles of SiGe, metal silicides,  photovoltaics complex metal/oxide stacks, and PZT, published in Journal of Vacuum...

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23 March 2016 - HORIBA Scientific, global leader in Raman spectroscopy, is sponsoring a Raman/AFM/TERS workshop with Penn State on Wednesday, May 11, 2016. The 1-day Raman workshop will offer presentations from leading scientists in both...

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18 March 2016 - HORIBA Scientific, global leader in ICP-OES spectrometry systems, announced its newest software release for their ICP-OES spectrometers.

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17 March 2016 - New cleaning mechanism enables repetitive measurements up to 200 times HORIBA Scientific, global leader in elemental analysis systems and solutions, just announced the

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1 March 2016 - During this webinar, you will learn how the combination of the X-Aptamer Selection Kit from AM Biotechnologies with HORIBA's SPRi system allows you to develop and screen aptamers from small molecules in a short period of time. In...

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