Liquid Source Vaporization System

HORIBA offer a wide variety of liquid source vaporization systems to vaporize precursors stably and efficiently. Depending on your specific application there are four methods to vaporize deposition precursors: direct injection, mixed injection, bubbling and baking. HORIBA’s products meet the strict requirements of the semiconductor manufacturing market and other ultra-high purity applications for precursors such as HMDSO, OMCTS, TEPO and TEOS.

HORIBA have taken flow measurement principles and developed them to a high level. Liquid mass flow products using the differential pressure across a fixed orifice method provide fast response mass flow measurement and can be controlled by an integrated, highly repeatable, piezo control valve. HORIBA also offer liquid and gas flow products using a thermal sensor with a unique cooling technique that gives excellent flow measurement performance ideal for temperature sensitive chemicals. These flow measurement products can be linked to HORIBA’s range of direct infection systems with integrated flow control valve to provide stable delivery in vapor phase of to the point of use. The direct injection valves vaporize the chemical by pressure drop and heat. The latest generation vaporizers utilise the ‘Tornado effect’ to dramatically improve the vaporisation rate and prevent thermal decomposition of the precursor. Direct injection and baking systems for vaporising TMA are widely used in photo voltaic applications.

HORIBA vaporizers can be linked with HORIBA’s range of automatic refill systems to provide continuous delivery of vapor without downtime. Bulk precursor tanks can be exchanged without interrupting the manufacturing process. Please check out HORIBA’s flow measurement products for accurate, repeatable and stable vaporisation of chemicals.

Some Liquid Materials HORIBA Has Experience With

Liquid Materials HORIBA has experiences
Acetic Acid Benzene B(OCH3)3 BTBAS C6F6
Cyclohexane Decyl-TMOS DPM DPMS Ethanol
HMDS HMDSO i-Octane IPA Me-Cyclohexane
Methanol n-Octane OMCTS OMTS P(OCH3)3
PO(OCH3)3 SAM24 Si(CH3)4 Si(OCH3)4 SiCH3Cl3
SiCl4 SiH(OCH3)3 SiHCl3 Ta(OC2H5)5 TBTDETa
Ti(O-iPr)4 TiCl4 TMCTS Toluene 1,3-DMA

Please contact us if you require vaporizing any liquid materials that are not listed above.

Mixed Injection (Carrier Gas Type)

Mixed Injection System MV-2000

High stability, compact mixed injection vaporizer system using the new vaporization method, "tornado flow". Suitable for vaporizing liquid sources pyrolyzed easily.

Baking System (Non-Carrier Gas Type)

Compact Baking System LSC Series

Best-selling, compact baking system suitable for a range of liquid source delivery applications. Easy maintenance.

Direct Injection (Non-Carrier Gas Type)

Direct Injection System VC Series

The compact vaporization system does not require carrier gas, it can be used with either a liquid or gas flow meter, allowing for easy integration for direct liquid injection.

Direct Injection (Carrier Gas Type)

Large Flow Liquid Source Vaporization Control System LE Series

Capable of large flow vaporization of hydrogen peroxide.

Liquid Auto Refill System

POCl3 Auto Refill System VDM Series

HORIBA's Award Winning Fluid Delivery System (FDM Series) has revolutionised the POCl3 diffusion process by developing a system to automatically deliver bulk liquid POCl3. This Auto Refill System achieves higher uptime, cost reduction, improved process stability and higher safety.

Liquid Auto Refill System LU Series

Automatic liquid refill system delivers chemicals directly to baking or direct liquid injection systems. Safe, efficient, and continuous supply of liquid sources.

Liquid Mass Flow Controller

Digital Liquid Flow Meter XF-100 Series

The fast response digital flow meter using differential-pressure measurement method, response time: 100 msec ( or less than 0.8 sec when it is used in combination with a piezo valve).

Digital Liquid Mass Flow Meters/Controllers LF-F/LV-F series

High precision liquid mass flow controller using the sensor with a unique cooling method. Can control from micro-liter to ultra low flow rate.