Chemical Analysis
Optimize processes and increase cell supply stability and conversion efficiency and reduce waste through real-time monitoring of chemical solution concentrations.
HORIBA’s chemical solution concentration monitors support the optimization of solar cell manufacturing processes through real-time measurement of chemical solution concentrations in cleaning and etching processes. This enables greater accuracy in chemical-based texture formation and the removal of impurities, contributing dramatically to improved conversion efficiency in crystalline silicon solar cells.
Support for multi-batu, single-bath, and dingle-wafer cleaning systems
Chemicals soulution concentration monitor has a compact profile, support for multi-bath, single-bath, and dingle-wafer cleaning systems
Ideal for hydrofluoric acid monitoring in semiconductor manufacturing
Middle range HF / HCl concentration Monitor. The sensor is highly resistant to chemicals.
Measurement range: 0 -10%
High precision, high-speed measurement of low concentrations of HF, HCl, and NH3. Resistance sensor.
Wide range, carbon sensor conductivity meter for high concentration. Measurement rage: 0 - 1000 mS/cm
Compact resistivity meter for versatile porpose. Measurement range: 0 - 100.0 MΩ・cm