Applications of Plasma Emission Endpoint Monitor EV140C

By: Hiroshi Iida

28 February 2011

The Optical Emission Spectroscopy (OES) is major monitoring principle for detecting the process endpoint from signal trend changing of plasma emission in the process chamber of semiconductor manufacturing. The endpoint detection capability is improved by a CCD spectrograph which is able to use the wide range optical spectrum. But the CCD spectrograph brings difficulty of the analyzing operation to build the process endpoint condition due to huge data volume of wide range spectrum. And process users request also the capability of training a lot of data from manufacturing process. We explain about a practical example of the plasma emission endpoint monitor on manufacturing process in this article.

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