Developing the Standard Sample for the Reticle/Mask Particle Remover — Particle Remover RP-1 —

By: Tomoya SHIMIZU

31 May 2012


In manufacturing semiconductor devices, removing particles on a pellicle and a glass surface of a reticle has been frequently done by manual air blow or by adhesive substance. In this case, pellicles can be contaminated. To reduce the risk of causing such errors and keep reticles clean over the long term, we developed the Particle Remover RP-1 that automatically removes particles on a pellicle and a glass surface. This time, developing the standard sample allows to measure removal rate and repeat test, which assure performance of RP-1. Moreover, time dependency of the removal rate after attaching particles is reported.

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