Development of Capacitance Diaphragm Gauge

By: Sotaro KISHIDA

30 January 2018


Figure 1 Diagram of Capacitance Diaphragm Gauge

Author Information: Development Design Dept. 2, HORIBA STEC, Co., Ltd.

Abstruct: In the deposition process or an etching process that made to be used for the fabrication of LEDs, semiconductors, FPDs and solar cells, various gases are used and the process pressure gives large effect on product quality, so the excellent corrosion resistance, and without gas dependent, and high accuracy are required to vacuum gauge . To provide solutions to these requests, HORIBA STEC has developed the Capacitance Diaphragm Gauge “VG-200 Series”, and the results of the performance evaluation were superior reproducibility and long term stability. Here, we describe the product features and performance evaluation results of the VG-200.

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