EV-140 P, New Emission Spectroscopic Product for Semiconductor Endpoint, Cleaning and Plasma Chambers Control

By: E. BLUEM, J. VASSILAKIS, M. THIERCELIN, M. AUBÉ, H. BIRK

24 September 2012


To address new requirements in semiconductor Dry Etch and PECVD (Plasma Enhanced Chemical Vapor Deposition) industry, HORIBA Semiconductor has introduced a unique generation of (Multi) Sensor dedicated to Fault detection, Chamber health monitoring and Advanced Process Control. Hardware and Software issues are developed so that EV-140 P may be adapted to all etchers (clusters and single chambers) and to help researchers, engineers and Fabs to manage actual but also future products and technologies. Based on innovative technologies like smart sensors, unique software architecture, including analytical methodology and sophisticated signal processing, this platform allows satisfying all the needs of in-situ plasma process control. Our paper describes, first, Recipe Designer engineering flow and then results obtained in Fabs for Endpoint and chamber health monitoring applications, like immediate Misprocessing detection, Preventive maintenance setting, Statistics and Multi-run Viewer for quality control in order to secure wafers during critical process.

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