New Developments in GD Spectrometries for Advanced Materials Characterisation

By: Patrick CHAPON, Agnes TEMPEZ

24 September 2012

Over than 70% of recent papers published with GD data refer to HORIBA Jobin Yvon instruments and several key patents give us a world leading position in the field. In this article we will illustrate the latest developments in GD Spectrometries through a survey of recently published articles. Pulsed RF Glow Discharge OES and Plasma Profiling TOFMS provide rapid depth profile composition of thin and thick layers of conductive and non conductive layers with excellent depth resolution, sensitivity and multi-element capability. Thus, they contribute to the development of new advanced materials and, being fast and easy to operate, they are changing the way people consider surface analysis.

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