The Current Status and Technical Issues,and Future Prospect for Extreme Ultraviolet Lithography

By: Takeo WATANABE*

11 April 2019


Figure 2 Beamline groups for EUV lithography at NewSUBARU synchrotron light facility

Guest Forum

Author(*) Information: Professor,Center for EUVL,Director,Laboratory of Advanced Science and Technology for Industry,Dean

Extreme ultraviolet lithography (EUVL) technology is to be used in 2019 as semiconductor mass production technology with line width of 16 nm circuit. I will introduce the current state, issues and future prospect for this technology development.Today, EUV technical issues as for the mass production technology are EUV light source development, EUV resist development, EUV mask development. We will introduce these technologies and discuss in detail how nanofabrication progresses in the future.

 

 

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