Ultra-Trace Analysis by X-Ray Fluorescence — Instrumentation of Novel Efficient Wavelength-Dispersive X-Ray Spectrometer and its Application to TXRF Experiments with Brilliant Synchrotrons —

By: Kenji Sakurai

31 August 2011

The present research is concerned with the instrumentation required to achieve extremely high detection rates for trace elements using X-ray fluorescence (XRF), which is a powerful non-destructive technique for element analysis. In total-reflection X-ray fluorescence (TXRF), which is known as a metrology tool for gauging the contamination of semiconductor surfaces, the use of an energy-dispersive system typically with a Si (Li) detector has been the only way so far to analyze trace elements. For many years, it had been believed that the wavelength-dispersive method was unsuitable for trace analysis. This is no longer the case, because of the advent of the present highly efficient XRF spectrometer. By combining TXRF with brilliant synchrotron radiation at the SPring-8, detection power has been upgraded to at least 10 times the prevailing world record. The detection limit is in the 10-16 g and/or ppt (10-12 g/g) range.

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