On-line monitoring of complex chemical products.

The LA-950V2 provides the widest dynamic range of any laser diffraction instrument on the market along with unrivalled performance on accuracy and precision.

HORIBA Scientific’s in- situ, in-line and large area ellipsometers are designed for the control of processes in research and industry. From in-situ thin film monitoring to large area uniformity mapping and in-line characterization of flexible devices, we offer a large range of solutions for thin film quality control.

HORIBA’s optical emission spectroscopy (OES) and interferometry systems provide real time end-point control for plasma-based semiconductor thin-film processing tools.