
Plasma Profiling TOFMS
General
- A. Tempez, S. Legendre, P. Chapon, Depth profile analysis by plasma profiling time of flight mass
Spectrometry, Nucl. Instr. Meth. B, 332, 351-354 (2014). doi:10.1016/j.nimb.2014.02.094
Oxides
- A. Tempez, S. Legendre, P. Chapon, Multidimensional Depth Profile Analysis of Oxide Layers by Plasma Profiling Techniques: GD-OES and PP-TOFMS, Proc. SPIE Photonics (International Society for Optics and Photonics) SPIE 8626, Oxide-based Materials and Devices IV, 862608 (March 18, 2013).
DOI:10.1117/12.2010085
Thermoelectric materials
Sb2Te3, Bi2Te3
- K.-G. Reinsberg, C. Schumacher, A. Tempez, K. Nielsch, J.A.C. Broekaert, Depth-profile analysis of thermoelectric layers on Si wafers by pulsed r.f. glow discharge time-of-flight mass spectrometry Spectrochimica Acta Part B: Atomic Spectroscopy, 2012, 76, 175-180. DOI 10.1016/j.sab.2012.06.005