Thin Film Silicon
Thin Film Silicon production process and HORIBA's products supporting this process.
Related Products
Below you can see the different stages during the Thin Film Silicon production process. Please click on each phase in order to see the products that are available to you during this stage.
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EMAX ENERGY combined with SEM is an energy dispersive X-ray analyzer which is suited for foreign material and composition analysis. It matches the samples in many applications.
Analyzer is designed to provide pertinent...
The GD-Profiler 2™ provides fast, simultaneous analysis of all elements of interest including the gases nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization and process studies.
High spectral resolution analytical Raman microscope for ultimate performance and flexibility; includes UV Raman configuration, full automation and wide range of accessories.
Single point analysis and automated hyperspectral imaging.
Dual vacuum modes.
Spot sizes from 1.2 mm to 10 µm.
Compact process gas monitor using quadrupole mass spectrometer. Monitors trace gases, responds quickly to process shift . Easy to install and maintain.
HORIBA's Award Winning Fluid Delivery System (FDM Series) has revolutionised the POCl3 diffusion process by developing a system to automatically deliver bulk liquid POCl3. This Auto Refill System achieves higher uptime, cost reduction, improved process stability and higher safety.
Vaporize liquid source stably by the gas-liquid mixture vaporization method. Can be used for low temperature and large flow production.
Automatic liquid refill system delivers chemicals directly to baking or direct liquid injection systems. Safe, efficient, and continuous supply of liquid sources.
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Gas Concentration Monitor
In-line compact vapor concentration monitor, enables MOCVD precursor delivery to be stable.
Visualize your sample and measure thin film thickness and optical constants in seconds.
"With Auto SE, routine work will never be the same!"
NEW NIR Extended Spectral Range !
Emission analysis type end-point monitor intended for end-point detection or plasma condition control in the plasma-based semiconductor thin-film process.
The ultimate solution to every challenge in thin film measurement