Establishment of New Flow Standard Technology

By: Yasuhiro ISOBE

January 30, 2018

Figure 1 Kyoto Fukuchiyama Technology Center

Author Information: Fukuchiyama Technology Center, HORIBA STEC, Co., Ltd.

Abstruct: Higher accuracy and reliability for gas flow and liquid material supply are requested with the miniaturization and high integration of leading edge semiconductor device. To meet the requirement, at Kyoto Fukuchiyama technology center, we aim to establish flow standard technologies that are to develop flow standards, to standardize method of process gas flow measurement and to be accredited to ISO/IEC 17025 as a flow calibration authority. In this issue, we introduce our efforts for standardization of flow standard technology

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