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Particle Detection System

HORIBA offer systems which are widely used in the semiconductor lithography process. These systems detect particles on a reticle/mask with high reliability and long-term stability. The systems can measure particles on each glass/pellicle surface with precision and high throughput contributing to yield improvements for any semiconductor manufacturing facility. HORIBA also provide a Particle Remover that is designed to be used in conjunction with the detection system to automatically remove any particles detected.

Related Products

PR-PD2
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Reticle/Mask Particle Detection System

PR-PD2BLI
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Blanks Mask Particle Detection System

PR-PD2HR
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Reticle / Mask Particle Detection System

PR-PD3
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Compact Reticle/Mask Particle Detection System

PR-PD3 BLI
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Particles on Blank Mask

PR-PD5
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Low-cost Reticle/Mask Particle Detection System

RP-1
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Reticle/Mask Particle Remover

Gas and Water Monitoring in Containers and Packaging

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