Ellipsometry basics: A powerful thin films characterization technique

|   Event

You are invited to register for our new webinar: Thursday, February 26th, at 9 AM (GMT); 10 AM (CET), or at 4 PM (GMT); 5 PM (CET)

Event

Beginning: 02/26/26

Location: Online

Two sessions are available for this webinar:

  • 9 AM GMT / 10 AM CET / 5 PM CST / 6 PM JST
  • 4 PM GMT / 5 PM CET / 8 AM PST / 11 AM EST
     

Ellipsometry is a well-known, yet sometimes not well understood, characterization techniques for thin films. Based on light polarization and indirect determination of parameters, ellipsometry enables obtaining thin film thickness and optical parameters, roughness, porosity or even compositional information about simple layers & complex stacks. Very useful in the fields of semiconductors, PV, optical coatings and every application using thin films, ellipsometry reached for some years now an instrumental maturity which enables to open its use to non-expert users. Come and (re)discover the basics of this powerful ltechnique for your materials characterization needs!

Key Learning Objectives

  • Learn or recall the basics of ellipsometry
     

Who Should Attend

  • Material characterization scientists
  • Semiconductors experts
  • General audience, Students
     

 

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